Epson Couture Fashion Week 2016
Featuring the Epson F2000 Series dye-sublimation and direct-to-garment technologies enable limitless design possibilities across the textile and fashion industry ,the second annual Epson Digital Couture event will showcased the design capabilities through the featured collections of designers from North and Latin America:
Chloe Trujillo from Los Angeles, Calif.
Cristina Ruales from Brooklyn, N.Y.
Fabrizzio Berrocal from Costa Rica
GM by Gustavo Moscoso from Ecuador
Kaleidoscopic by María de Lourdes Ramírez and Isabel Navarro Landa from Mexico
LENERD by Felipe Santamaría Luque from Colombia
Matías Hernán from Chile
Ossira by Agostina Orlandi and Ludmila Osikovsky from Argentina
Pionier by Janet Ríos and Carmen Artica from Peru
Santika by Danny Santiago from Miami, Fla.
Tigresse by Fabio Yukio from Brazil
Epson Couture Fashion Week 2015
February 9th, 2015 in the heart of New York’s West Village at Industria Superstudio, Epson featuring the SureColor® F-Series dye sublimation printing machine debuted the collections from 11 South and North American designers for Epson’s fashion meets technology series. Each designer was commissioned to envision and execute a collection using Epson’s digital dye sublimation technology, a relatively new type of printer allowing designers to alter designs with a one-stop printing and design process. The list of designers includes:
Ay Not Dead from Argentina
Pilar Briceño from Colombia
Dual from Costa Rica
ESOSA from New York City
Leonor Silva representing the Caribbean (Venezuela to Miami)
Ma. Elisa Guillén from Ecuador
Maggie Barry from Los Angeles
Marco Antonio Farías from Chile
Mariana Morrell from Brazil
Moah Saldaña from Peru
Pineda Covalin from Mexico
